'The intellectual distance between clean and dirty technologies' with Su Jung Jee & Sugandha Srivastav

Past Event

21 October 2021, 3:00pm - 4:00pm

Online & Manor Road Building
Manor Road, Oxford, OX1 3UQ

INET Oxford
© iStock/Leszek Glasner

How difficult is the transition to a low-carbon technological paradigm? Join INET researchers Su Jung Jee and Sugandha Srivastav as they discuss their work.

Using the entire universe of patents granted by the USPTO from 1976 to 2020, the speakers have evaluated the intellectual distance between clean and dirty technologies. They measured intellectual distance by checking how many hops one has to make in the citation network to get from a clean patent to a dirty one (where one hop means the clean patent directly cites a prior dirty patent). They found that 73% of clean patents are connected in some way to dirty patents, while only 7.5% of clean patents directly cite dirty prior art. The mean distance between a clean and dirty patent is about 3 hops. By comparison, for any two randomly selected patents it is 8.5. In addition, they observed considerable heterogeneity across sectors. Their results suggest that targeted clean R&D may be needed to overcome “intellectual carbon lock-in”, and in sectors where clean and dirty technologies are distant, the transition may be less about diversification and more about Schumpeterian creative destruction.

Please note that this event is taking place in-person at the Manor Road Building and online via Zoom. You will need to register and indicate whether you wish to attend in person or online, and then you will receive further instructions.

For full details and registration: https://www.inet.ox.ac.uk/even...

This event is organised by INET Oxford